文献
J-GLOBAL ID:202002261989882730
整理番号:20A1105392
酸化物半導体に対する少数キャリア生成寿命の評価【JST・京大機械翻訳】
Evaluation of Minority Carrier Generation Lifetime for Oxide Semiconductors
著者 (5件):
Choi Pyungho
(Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon, Gyeonggi 16419, Republic of Korea)
,
Lee Sangmin
(Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon, Gyeonggi 16419, Republic of Korea)
,
Kim Hyojung
(Technology Reliability, OLED Business, Samsung Display Co., Ltd., Cheonan, Chungnam 31086, Republic of Korea)
,
Park Jungmin
(YE Team, PIE 1group, Foundry Business, Samsung Electronics Co., Ltd., Suwon, Gyeonggi 16419, Republic of Korea)
,
Choi Byoungdeog
(Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon, Gyeonggi 16419, Republic of Korea)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
704
ページ:
Null
発行年:
2020年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)