文献
J-GLOBAL ID:202002264592731454
整理番号:20A2454633
硬X線光学用の3D円形形状キノフォームレンズのためのグレースケール電子ビームリソグラフィーの研究【JST・京大機械翻訳】
A study of greyscale electron beam lithography for a 3D round shape Kinoform lens for hard X-ray optics
著者 (7件):
Tong Xujie
(Nanolithography and Application Research Group, School of Information Science and Engineering, Fudan University, Shanghai 200433, China)
,
Xu Chen
(Nanolithography and Application Research Group, School of Information Science and Engineering, Fudan University, Shanghai 200433, China)
,
Zhu Jingyuan
(Nanolithography and Application Research Group, School of Information Science and Engineering, Fudan University, Shanghai 200433, China)
,
Mao Chengwen
(Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China)
,
Zhen Xiangjun
(Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201210, China)
,
Huang Wanxia
(Beijing Synchrotron Radiation Laboratory, Institute of High Energy, Beijing 100039, China)
,
Chen Yifang
(Nanolithography and Application Research Group, School of Information Science and Engineering, Fudan University, Shanghai 200433, China)
資料名:
Microelectronic Engineering
(Microelectronic Engineering)
巻:
234
ページ:
Null
発行年:
2020年
JST資料番号:
C0406B
ISSN:
0167-9317
CODEN:
MIENEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)