文献
J-GLOBAL ID:202002269751706336
整理番号:20A0428754
磁性Weyl半金属Co_3Sn_2S_2薄膜のエピタキシャル成長と輸送特性【JST・京大機械翻訳】
Epitaxial Growth and Transport Properties of Magnetic Weyl Semimetal Co3Sn2S2 Thin Films
著者 (18件):
Li Shuhui
(Institute of Physics, Chinese Academy of Sciences, China)
,
Li Shuhui
(School of Physics, University of Chinese Academy of Sciences, China)
,
Gu Gangxu
(Institute of Physics, Chinese Academy of Sciences, China)
,
Gu Gangxu
(School of Physics, University of Chinese Academy of Sciences, China)
,
Liu Enke
(Institute of Physics, Chinese Academy of Sciences, China)
,
Liu Enke
(Max Planck Institute for Chemical Physics of Solids, Germany)
,
Cheng Peng
(Institute of Physics, Chinese Academy of Sciences, China)
,
Cheng Peng
(School of Physics, University of Chinese Academy of Sciences, China)
,
Feng Baojie
(Institute of Physics, Chinese Academy of Sciences, China)
,
Feng Baojie
(School of Physics, University of Chinese Academy of Sciences, China)
,
Li Yongqing
(Institute of Physics, Chinese Academy of Sciences, China)
,
Li Yongqing
(School of Physics, University of Chinese Academy of Sciences, China)
,
Li Yongqing
(Songshan Lake Materials Laboratory, Guangdong, China)
,
Chen Lan
(Institute of Physics, Chinese Academy of Sciences, China)
,
Chen Lan
(School of Physics, University of Chinese Academy of Sciences, China)
,
Wu Kehui
(Institute of Physics, Chinese Academy of Sciences, China)
,
Wu Kehui
(School of Physics, University of Chinese Academy of Sciences, China)
,
Wu Kehui
(Songshan Lake Materials Laboratory, Guangdong, China)
資料名:
ACS Applied Electronic Materials
(ACS Applied Electronic Materials)
巻:
2
号:
1
ページ:
126-133
発行年:
2020年
JST資料番号:
W5669A
ISSN:
2637-6113
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)