文献
J-GLOBAL ID:202002269798790345
整理番号:20A2707198
反応性高出力パルスマグネトロンスパッタリングによるα-(Al,Cr)_2O_3薄膜の低温堆積と硬度増強【JST・京大機械翻訳】
Low-temperature deposition and hardness enhancement of α-(Al,Cr)2O3 films by reactive high power pulsed magnetron sputtering
著者 (5件):
Cheng Yitian
(Institute of Intelligent Manufacturing Technology, Postdoctoral Innovation Practice Base, Shenzhen Polytechnic, Shenzhen, 518055, People’s Republic of China)
,
Cheng Yitian
(School of Materials Science and Engineering, Southeast University, Nanjing 210096, People’s Republic of China)
,
Chu Chenglin
(School of Materials Science and Engineering, Southeast University, Nanjing 210096, People’s Republic of China)
,
Zhou Peng
(Institute of Intelligent Manufacturing Technology, Postdoctoral Innovation Practice Base, Shenzhen Polytechnic, Shenzhen, 518055, People’s Republic of China)
,
Zhou Peng
(Department of Materials Science and Engineering, Southern University of Science and Technology, Shenzhen, 518055, People’s Republic of China)
資料名:
Materials Research Express
(Materials Research Express)
巻:
7
号:
11
ページ:
116407 (7pp)
発行年:
2020年
JST資料番号:
W5570A
ISSN:
2053-1591
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)