文献
J-GLOBAL ID:202002271939609494
整理番号:20A1246265
高伝導性酸化物SrMoO_3の分子ビームエピタクシー成長【JST・京大機械翻訳】
Molecular beam epitaxy growth of the highly conductive oxide SrMoO3
著者 (10件):
Takatsu Hiroshi
(Department of Energy and Hydrocarbon Chemistry, Graduate School of Engineering, Kyoto University, Kyoto 615-8510, Japan)
,
Yamashina Naoya
(Department of Energy and Hydrocarbon Chemistry, Graduate School of Engineering, Kyoto University, Kyoto 615-8510, Japan)
,
Shiga Daisuke
(Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization (KEK), 1-1 Oho, Tsukuba 305-0801, Japan)
,
Shiga Daisuke
(Department of Physics, Tohoku University, Sendai 980-8578, Japan)
,
Yukawa Ryu
(Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization (KEK), 1-1 Oho, Tsukuba 305-0801, Japan)
,
Horiba Koji
(Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization (KEK), 1-1 Oho, Tsukuba 305-0801, Japan)
,
Kumigashira Hiroshi
(Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization (KEK), 1-1 Oho, Tsukuba 305-0801, Japan)
,
Kumigashira Hiroshi
(Department of Physics, Tohoku University, Sendai 980-8578, Japan)
,
Terashima Takahito
(Department of Physics, Graduate School of Science, Kyoto University, Kyoto 606-8502, Japan)
,
Kageyama Hiroshi
(Department of Energy and Hydrocarbon Chemistry, Graduate School of Engineering, Kyoto University, Kyoto 615-8510, Japan)
資料名:
Journal of Crystal Growth
(Journal of Crystal Growth)
巻:
543
ページ:
Null
発行年:
2020年
JST資料番号:
B0942A
ISSN:
0022-0248
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)