文献
J-GLOBAL ID:202002288651567487
整理番号:20A1235612
室温ボンディングに適した極めて平滑な表面を有する厚い酸化物膜を作製するためのスパッタ膜堆積
Sputter film deposition to fabricate thick oxide films with extremely smooth surface suitable for room-temperature bonding
著者 (10件):
Saito T.
(Canon ANELVA Corporation, Kurigi 2-5-1, Asao, Kawasaki 215-8550, Japan)
,
Makita H.
(Canon ANELVA Corporation, Kurigi 2-5-1, Asao, Kawasaki 215-8550, Japan)
,
Moriwaki T.
(Canon ANELVA Corporation, Kurigi 2-5-1, Asao, Kawasaki 215-8550, Japan)
,
Suzuki Y.
(Canon ANELVA Corporation, Kurigi 2-5-1, Asao, Kawasaki 215-8550, Japan)
,
Kato N.
(Canon ANELVA Corporation, Kurigi 2-5-1, Asao, Kawasaki 215-8550, Japan)
,
Wakayanagi S.
(Canon ANELVA Corporation, Kurigi 2-5-1, Asao, Kawasaki 215-8550, Japan)
,
Miura A.
(Frontier Research Institute for Interdisciplinary Sciences (FRIS), Tohoku University, Sendai 980-8578, Japan)
,
Uomoto M.
(Frontier Research Institute for Interdisciplinary Sciences (FRIS), Tohoku University, Sendai 980-8578, Japan)
,
Shimatsu T.
(Frontier Research Institute for Interdisciplinary Sciences (FRIS), Tohoku University, Sendai 980-8578, Japan)
,
Shimatsu T.
(Research Institute of Electrical Communication (RIEC), Tohoku University, Sendai 980-8577, Japan)
資料名:
Japanese Journal of Applied Physics
(Japanese Journal of Applied Physics)
巻:
59
号:
SB
ページ:
SBBC02 (3pp)
発行年:
2020年02月
JST資料番号:
G0520B
ISSN:
0021-4922
CODEN:
JJAPB6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)