文献
J-GLOBAL ID:202002291984164840
整理番号:20A1919985
マグネトロン共スパッタリングにより成長させたGeリッチAl_2O_3膜の相転移の分光学的キャラクタリゼーション【JST・京大機械翻訳】
Spectroscopic characterization of phase transformation in Ge-rich Al2O3 films grown by magnetron co-sputtering
著者 (10件):
Khomenkova L.
(V. Lashkaryov Institute of Semiconductor Physics, 45 Pr. Nauky, Kyiv 03028, Ukraine)
,
Khomenkova L.
(National University “Kyiv-Mohyla Academy”, 2 Skovorody str, Kyiv 04070, Ukraine)
,
Makasheva K.
(LAPLACE, Universite de Toulouse, CNRS, 118 route de Narbonne, 31062 Toulouse, France)
,
Petrik P.
(Institute for Technical Physics and Materials Science, Center for Energy Research, Konkoly Thege Rd. 29-33, 1121 Budapest, Hungary)
,
Tsybrii Z.
(V. Lashkaryov Institute of Semiconductor Physics, 45 Pr. Nauky, Kyiv 03028, Ukraine)
,
Melnichuk O.
(Mykola Gogol Nizhyn State University, 2 Grafska str, Nizhyn 16600, Ukraine)
,
Melnichuk L.
(Mykola Gogol Nizhyn State University, 2 Grafska str, Nizhyn 16600, Ukraine)
,
Balberg I.
(The Racah Institute of Physics, The Hebrew University E.J. Saphra Campus, Jerusalem 9190401, Israel)
,
Gourbilleau F.
(CIMAP, Normandie Univ, ENSICAEN, UNICAEN, CEA, CNRS, 6 Boulevard Marechal Juin, 14050 Caen Cedex 4, France)
,
Korsunska N.
(V. Lashkaryov Institute of Semiconductor Physics, 45 Pr. Nauky, Kyiv 03028, Ukraine)
資料名:
Materials Letters
(Materials Letters)
巻:
277
ページ:
Null
発行年:
2020年
JST資料番号:
E0935A
ISSN:
0167-577X
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
オランダ (NLD)
言語:
英語 (EN)