文献
J-GLOBAL ID:202102238395202818
整理番号:21A0167726
蒸発沈着の制御に向けて:基質,溶媒および溶質の効果【JST・京大機械翻訳】
Toward Controlling Evaporative Deposition: Effects of Substrate, Solvent, and Solute
著者 (5件):
Gogoi Prerona
(Department of Chemical Engineering, Indian Institute of Technology Guwahati, Assam, India)
,
Chattopadhyay Arun
(Department of Chemistry, Indian Institute of Technology Guwahati, Assam, India)
,
Chattopadhyay Arun
(Centre for Nanotechnology, Indian Institute of Technology Guwahati, Assam, India)
,
Gooh Pattader Partho Sarathi
(Department of Chemical Engineering, Indian Institute of Technology Guwahati, Assam, India)
,
Gooh Pattader Partho Sarathi
(Centre for Nanotechnology, Indian Institute of Technology Guwahati, Assam, India)
資料名:
Journal of Physical Chemistry B
(Journal of Physical Chemistry B)
巻:
124
号:
50
ページ:
11530-11539
発行年:
2020年
JST資料番号:
W0921A
ISSN:
1520-6106
CODEN:
JPCBFK
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)