文献
J-GLOBAL ID:202102245177608571
整理番号:21A2588555
半導体ブリッジ(SCB)プラズマの特性研究【JST・京大機械翻訳】
Research of the Characteristics of Semiconductor Bridge (SCB) Plasma
著者 (4件):
Wang Renbao
(Hefei University, School of Advanced Manufacturing Engineering, Hefei 230601, China)
,
Zhu Shunguan
(Nanjing University of Science and Technology, School of Chemical Engineering, Nanjng 210094, China)
,
Sun Qiang
(Hefei University, School of Advanced Manufacturing Engineering, Hefei 230601, China)
,
Xu Zhenfeng
(Hefei University, School of Advanced Manufacturing Engineering, Hefei 230601, China)
資料名:
Fusion Science and Technology
(Fusion Science and Technology)
巻:
77
号:
6
ページ:
463-468
発行年:
2021年
JST資料番号:
A0310B
ISSN:
1536-1055
CODEN:
FUSTE8
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)