文献
J-GLOBAL ID:202102247655794543
整理番号:21A0463297
CaKFe_4As_4単結晶における臨界電流密度を増強する平面欠陥の起源の解明【JST・京大機械翻訳】
Elucidating the origin of planar defects that enhance critical current density in CaKFe4As4 single crystals
著者 (4件):
Ichinose Ataru
(Electric Power Engineering Research Laboratory, Central Research Institute of Electric Power Industry, 2-6-1 Nagasaka, Yokosuka-shi, Kanagawa 240-0196, Japan)
,
Pyon Sunseng
(Department of Applied Physics, The University of Tokyo, 7-3-1 Hongo, Bunkyo-Ku, Tokyo 113-8656, Japan)
,
Tamegai Tsuyoshi
(Department of Applied Physics, The University of Tokyo, 7-3-1 Hongo, Bunkyo-Ku, Tokyo 113-8656, Japan)
,
Ishida Shigeyuki
(Research Institute for Advanced Electronics and Photonics, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan)
資料名:
Superconductor Science and Technology
(Superconductor Science and Technology)
巻:
34
号:
3
ページ:
034003 (7pp)
発行年:
2021年
JST資料番号:
T0607A
ISSN:
0953-2048
CODEN:
SUSTEF
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)