文献
J-GLOBAL ID:202102252850329152
整理番号:21A0590084
誘導結合プラズマにおける受動共鳴コイルを用いた局所電子およびイオン密度制御【JST・京大機械翻訳】
Local electron and ion density control using passive resonant coils in inductively coupled plasma
著者 (6件):
Kim Tae-Woo
(Department of Electrical Engineering, Hanyang University, Seoul 133-791, Republic of Korea)
,
Lee Moo-Young
(Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Republic of Korea)
,
Hong Young-Hun
(Department of Electrical Engineering, Hanyang University, Seoul 133-791, Republic of Korea)
,
Lee Moo-Hyun
(Department of Nanoscale Semiconductor Engineering, Hanyang University, Seoul 133-791, Republic of Korea)
,
Kim Ju-Ho
(Department of Electrical Engineering, Hanyang University, Seoul 133-791, Republic of Korea)
,
Chung Chin-Wook
(Department of Electrical Engineering, Hanyang University, Seoul 133-791, Republic of Korea)
資料名:
Plasma Sources Science and Technology
(Plasma Sources Science and Technology)
巻:
30
号:
2
ページ:
025002 (9pp)
発行年:
2021年
JST資料番号:
W0479A
ISSN:
0963-0252
CODEN:
PSTEEU
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)