文献
J-GLOBAL ID:202102273786298394
整理番号:21A2169693
懸垂導波路用のSiO_2薄膜の応力と屈折率制御【JST・京大機械翻訳】
Stress and Refractive Index Control of SiO2 Thin Films for Suspended Waveguides
著者 (4件):
Wostbrock Neal
(Department of Nanoscience and Microsystems Engineering, School of Engineering, University of New Mexico, MSC01 1120, Albuquerque, NM 87131-0001, USA)
,
Wostbrock Neal
(Center for High Technology Materials (CHTM), University of New Mexico, MSC04 2710, 1313 Goddard SE, Albuquerque, NM 87106-4343, USA)
,
Busani Tito
(Center for High Technology Materials (CHTM), University of New Mexico, MSC04 2710, 1313 Goddard SE, Albuquerque, NM 87106-4343, USA)
,
Busani Tito
(Department of Electrical and Computer Engineering (ECE), School of Engineering, University of New Mexico, MSC01 1100, Albuquerque, NM 87131-0001, USA)
資料名:
Nanomaterials (Web)
(Nanomaterials (Web))
巻:
10
号:
11
ページ:
2105
発行年:
2020年
JST資料番号:
U7252A
ISSN:
2079-4991
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
スイス (CHE)
言語:
英語 (EN)