文献
J-GLOBAL ID:202102279370016586
整理番号:21A0012058
部分波形格子を用いた非冷却EMLに対する残留ファセット反射に対する改善された免疫の実証【JST・京大機械翻訳】
Demonstration of Improved Immunity to Residual Facet Reflection for Uncooled EMLs with Partially Corrugated Grating
著者 (7件):
Sulikhah Siti
(National Taiwan University of Science and Technology,Department of Electronic and Computer Engineering,Taipei,Taiwan,10607)
,
Lee San-Liang
(National Taiwan University of Science and Technology,Department of Electronic and Computer Engineering,Taipei,Taiwan,10607)
,
Chang Che-Jen
(Source Photonics,Department of Optoelectronics R&D,Hsinchu,Taiwan, ROC)
,
Ren Dawei
(Source Photonics,Department of Optoelectronics R&D,Hsinchu,Taiwan, ROC)
,
Chou Emin
(Source Photonics,Department of Optoelectronics R&D,Hsinchu,Taiwan, ROC)
,
Jan Yu-Heng
(Source Photonics,Department of Optoelectronics R&D,Hsinchu,Taiwan, ROC)
,
Tsao Hen-Wai
(National Taiwan University,Department of Electrical Engineering,Taipei,Taiwan,106)
資料名:
IEEE Conference Proceedings
(IEEE Conference Proceedings)
巻:
2020
号:
OECC
ページ:
1-3
発行年:
2020年
JST資料番号:
W2441A
資料種別:
会議録 (C)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)