文献
J-GLOBAL ID:202202225823850854
整理番号:22A1047744
多結晶シリコンウエハの配向,表面形態,不純物濃度および反射率の研究【JST・京大機械翻訳】
Investigation of orientation, surface morphology, impurity concentration and reflectivity of the multi-crystalline silicon wafers
著者 (7件):
Durairaj Sivaraj
(SSN Research Centre, Sri Sivasubramaniya Nadar College of Engineering, Chennai, 603110, India)
,
Kesavan V.
(SSN Research Centre, Sri Sivasubramaniya Nadar College of Engineering, Chennai, 603110, India)
,
Kesavan V.
(Department of Electronics, St Joseph’s College (Autonomous), Tiruchirappalli, 620002, India)
,
Keerthivasan T.
(SSN Research Centre, Sri Sivasubramaniya Nadar College of Engineering, Chennai, 603110, India)
,
Avinash Kumar M.
(SSN Research Centre, Sri Sivasubramaniya Nadar College of Engineering, Chennai, 603110, India)
,
Srinivasan M.
(SSN Research Centre, Sri Sivasubramaniya Nadar College of Engineering, Chennai, 603110, India)
,
Ramasamy P.
(SSN Research Centre, Sri Sivasubramaniya Nadar College of Engineering, Chennai, 603110, India)
資料名:
Materials Chemistry and Physics
(Materials Chemistry and Physics)
巻:
282
ページ:
Null
発行年:
2022年
JST資料番号:
E0934A
ISSN:
0254-0584
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)