文献
J-GLOBAL ID:202202239276908029
整理番号:22A1043671
Siナノワイヤからの光支援電界放出における負性微分抵抗【JST・京大機械翻訳】
Negative differential resistance in photoassisted field emission from Si nanowires
著者 (9件):
Choueib M.
(Departement de chimie, Universite de Montreal, Montreal, Quebec H3T 1J4, Canada)
,
Derouet A.
(Institut Lumiere Matiere, Universite Lyon 1, CNRS, UMR 5306, F-69622 Villeurbanne Cedex, France)
,
Vincent P.
(Institut Lumiere Matiere, Universite Lyon 1, CNRS, UMR 5306, F-69622 Villeurbanne Cedex, France)
,
Ayari A.
(Institut Lumiere Matiere, Universite Lyon 1, CNRS, UMR 5306, F-69622 Villeurbanne Cedex, France)
,
Perisanu S.
(Institut Lumiere Matiere, Universite Lyon 1, CNRS, UMR 5306, F-69622 Villeurbanne Cedex, France)
,
Poncharal P.
(Institut Lumiere Matiere, Universite Lyon 1, CNRS, UMR 5306, F-69622 Villeurbanne Cedex, France)
,
Cojocaru C. S.
(Ecole Polytechnique LPICM, UMR 7647, F-91128 Palaiseau, France)
,
Martel R.
(Departement de chimie, Universite de Montreal, Montreal, Quebec H3T 1J4, Canada)
,
Purcell S. T.
(Institut Lumiere Matiere, Universite Lyon 1, CNRS, UMR 5306, F-69622 Villeurbanne Cedex, France)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
40
号:
2
ページ:
022802-022802-8
発行年:
2022年
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)