文献
J-GLOBAL ID:202202244446963702
整理番号:22A1155909
プラズマ電解研磨における蒸気ガスエンベロープゆらぎの特性と機能【JST・京大機械翻訳】
Characteristics and function of vapour gaseous envelope fluctuation in plasma electrolytic polishing
著者 (5件):
Zhou Chuanqiang
(College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, China)
,
Su Honghua
(College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, China)
,
Qian Ning
(College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, China)
,
Zhang Zhao
(College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, China)
,
Xu Jiuhua
(College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, China)
資料名:
International Journal of Advanced Manufacturing Technology
(International Journal of Advanced Manufacturing Technology)
巻:
119
号:
11-12
ページ:
7815-7825
発行年:
2022年
JST資料番号:
T0397A
ISSN:
0268-3768
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)