文献
J-GLOBAL ID:202202249958499910
整理番号:22A0971860
記録キセノン/クリプトン分離のためのロバストで耐放射線性のHofmann型金属-有機骨格【JST・京大機械翻訳】
Robust and Radiation-Resistant Hofmann-Type Metal-Organic Frameworks for Record Xenon/Krypton Separation
著者 (6件):
Pei Jiyan
(State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, China)
,
Gu Xiao-Wen
(State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, China)
,
Liang Cong-Cong
(State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, China)
,
Chen Banglin
(Department of Chemistry, University of Texas at San Antonio, Texas, United States)
,
Li Bin
(State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, China)
,
Qian Guodong
(State Key Laboratory of Silicon Materials, School of Materials Science and Engineering, Zhejiang University, China)
資料名:
Journal of the American Chemical Society
(Journal of the American Chemical Society)
巻:
144
号:
7
ページ:
3200-3209
発行年:
2022年
JST資料番号:
C0254A
ISSN:
0002-7863
CODEN:
JACSAT
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)