文献
J-GLOBAL ID:202202250155124224
整理番号:22A0976666
フレキシブルオプトエレクトロニクス応用のためのCsPbBr_3膜のVan der Waalsエピタキシャル堆積【JST・京大機械翻訳】
Van der Waals Epitaxial Deposition of CsPbBr3 Films for Flexible Optoelectronic Applications
著者 (10件):
Xing Ruofei
(School of Physics and State Key Laboratory of Crystal Materials, Shandong University, China)
,
Shi Peng
(School of Physics and State Key Laboratory of Crystal Materials, Shandong University, China)
,
Wu Zhenfa
(School of Physics and State Key Laboratory of Crystal Materials, Shandong University, China)
,
Wang Dong
(School of Physics and State Key Laboratory of Crystal Materials, Shandong University, China)
,
Wei Lin
(School of Microelectronics, Shandong University, China)
,
Yan Shishen
(School of Physics and State Key Laboratory of Crystal Materials, Shandong University, China)
,
Chen Yanxue
(School of Physics and State Key Laboratory of Crystal Materials, Shandong University, China)
,
Ren Huixue
(School of Municipal and Environmental Engineering, Shandong Jianzhu University, China)
,
Yu Chunfeng
(Shandong Sanqi Energy Co., Ltd, China)
,
Li Fangjun
(Shandong Sanqi Energy Co., Ltd, China)
資料名:
ACS Applied Electronic Materials
(ACS Applied Electronic Materials)
巻:
4
号:
3
ページ:
1351-1358
発行年:
2022年
JST資料番号:
W5669A
ISSN:
2637-6113
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)