文献
J-GLOBAL ID:202202250841107908
整理番号:22A0327425
窒化銅薄膜のための高出力インパルスマグネトロンスパッタリング成長過程とその高増強UV-可視光検出特性【JST・京大機械翻訳】
High power impulse magnetron sputtering growth processes for copper nitride thin film and its highly enhanced UV - visible photodetection properties
著者 (9件):
Sakalley Shikha
(Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan)
,
Sakalley Shikha
(Department of Materials Engineering and Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei City 243, Taiwan)
,
Saravanan Adhimoorthy
(Graduate Institute of Electro-Optical Engineering and Department of Electronic and Computer Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan)
,
Cheng Wei-Chun
(Department of Mechanical Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan)
,
Chen Sheng-Chi
(Department of Materials Engineering and Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei City 243, Taiwan)
,
Chen Sheng-Chi
(College of Engineering and Center for Green Technology, Chang Gung University, Taoyuan 333, Taiwan)
,
Sun Hui
(School of Space Science and Physics, Shandong University, Weihai 264209, China)
,
Hsu Cheng-Liang
(Department of Electrical Engineering, National University of Tainan, Tainan 700, Taiwan)
,
Huang Bohr-Ran
(Graduate Institute of Electro-Optical Engineering and Department of Electronic and Computer Engineering, National Taiwan University of Science and Technology, Taipei 106, Taiwan)
資料名:
Journal of Alloys and Compounds
(Journal of Alloys and Compounds)
巻:
896
ページ:
Null
発行年:
2022年
JST資料番号:
D0083A
ISSN:
0925-8388
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)