文献
J-GLOBAL ID:202202260023305188
整理番号:22A0898218
高速重イオン照射による非晶質HfO_2膜の高k相形成【JST・京大機械翻訳】
The higher-k phase formation in amorphous HfO2 films by swift heavy ion irradiation
著者 (9件):
Li Zongzhen
(Institute of Modern Physics, Chinese Academy of Sciences (CAS), Lanzhou 730000, China)
,
Liu Jie
(Institute of Modern Physics, Chinese Academy of Sciences (CAS), Lanzhou 730000, China)
,
Zhai Pengfei
(Institute of Modern Physics, Chinese Academy of Sciences (CAS), Lanzhou 730000, China)
,
Liu Li
(Institute of Modern Physics, Chinese Academy of Sciences (CAS), Lanzhou 730000, China)
,
Liu Li
(School of Nuclear Science and Technology, University of Chinese Academy of Sciences, Beijing 100049, China)
,
Xu Lijun
(Institute of Modern Physics, Chinese Academy of Sciences (CAS), Lanzhou 730000, China)
,
Zhang Shengxia
(Institute of Modern Physics, Chinese Academy of Sciences (CAS), Lanzhou 730000, China)
,
Hu Peipei
(Institute of Modern Physics, Chinese Academy of Sciences (CAS), Lanzhou 730000, China)
,
Zeng Jian
(Institute of Modern Physics, Chinese Academy of Sciences (CAS), Lanzhou 730000, China)
資料名:
Journal of Crystal Growth
(Journal of Crystal Growth)
巻:
585
ページ:
Null
発行年:
2022年
JST資料番号:
B0942A
ISSN:
0022-0248
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)