文献
J-GLOBAL ID:202202262121484977
整理番号:22A1094673
シリコン中の有限サイズ拡張格子間欠陥の原子構造と安定性:神経回路網ポテンシャルによる大規模分子シミュレーション【JST・京大機械翻訳】
Atomic structures and stability of finite-size extended interstitial defects in silicon: Large-scale molecular simulations with a neural-network potential
著者 (9件):
Ohbitsu Masato
(Graduate School of Computer Science and Systems Engineering, Okayama Prefectural University, Soja, Okayama 719-1197, Japan)
,
Yokoi Tatsuya
(Department of Materials Physics, Nagoya University, Nagoya 464-8603, Japan)
,
Noda Yusuke
(Department of Information and Communication Engineering, Okayama Prefectural University, Soja, Okayama 719-1197, Japan)
,
Kamiyama Eiji
(Department of Information and Communication Engineering, Okayama Prefectural University, Soja, Okayama 719-1197, Japan)
,
Ushiro Takuto
(Graduate School of Computer Science and Systems Engineering, Okayama Prefectural University, Soja, Okayama 719-1197, Japan)
,
Nagakura Hiroki
(Graduate School of Computer Science and Systems Engineering, Okayama Prefectural University, Soja, Okayama 719-1197, Japan)
,
Sueoka Koji
(Department of Information and Communication Engineering, Okayama Prefectural University, Soja, Okayama 719-1197, Japan)
,
Matsunaga Katsuyuki
(Department of Materials Physics, Nagoya University, Nagoya 464-8603, Japan)
,
Matsunaga Katsuyuki
(Nanostructures Research Laboratory, Japan Fine Ceramics Center, Nagoya 456-8587, Japan)
資料名:
Scripta Materialia
(Scripta Materialia)
巻:
214
ページ:
Null
発行年:
2022年
JST資料番号:
B0915A
ISSN:
1359-6462
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)