文献
J-GLOBAL ID:202202272875687259
整理番号:22A0901301
シリコン基板上のエピタキシャル酸化膜の結晶配向【JST・京大機械翻訳】
Crystal orientation of epitaxial oxide film on silicon substrate
著者 (15件):
Kaneko Satoru
(National Cheng Kung University, Tainan, 701, Taiwan)
,
Kaneko Satoru
(Kanagawa Institute of Industrial Science and Technology (KISTEC), Shimo-Imaizumi, Ebina, Kanagawa 243-0435, Japan)
,
Kaneko Satoru
(Tokyo Institute of Technology, Nagatsuta, Yokohama, Kanagawa 226-8502, Japan)
,
Tokumasu Takashi
(Tohoku University, Sendai, Miyagi 980-8577, Japan)
,
Yasui Manabu
(Kanagawa Institute of Industrial Science and Technology (KISTEC), Shimo-Imaizumi, Ebina, Kanagawa 243-0435, Japan)
,
Kurouchi Masahito
(Kanagawa Institute of Industrial Science and Technology (KISTEC), Shimo-Imaizumi, Ebina, Kanagawa 243-0435, Japan)
,
Yasuhara Shigeo
(Japan Advanced Chemicals, Kamimizo, Kamimizo, Sagamihara 252-0131, Japan)
,
Endo Tamio
(Japan Advanced Chemicals, Kamimizo, Kamimizo, Sagamihara 252-0131, Japan)
,
Azuma Masaki
(Tokyo Institute of Technology, Nagatsuta, Yokohama, Kanagawa 226-8502, Japan)
,
Matsuda Akufumi
(Tokyo Institute of Technology, Nagatsuta, Yokohama, Kanagawa 226-8502, Japan)
,
Yoshimoto Mamoru
(Tokyo Institute of Technology, Nagatsuta, Yokohama, Kanagawa 226-8502, Japan)
,
Sahoo Sumanta Kumar
(National Cheng Kung University, Tainan, 701, Taiwan)
,
Sardar Kripasindhu
(National Cheng Kung University, Tainan, 701, Taiwan)
,
Ting Jyh-Ming
(National Cheng Kung University, Tainan, 701, Taiwan)
,
Yoshimura Masahiro
(National Cheng Kung University, Tainan, 701, Taiwan)
資料名:
Applied Surface Science
(Applied Surface Science)
巻:
586
ページ:
Null
発行年:
2022年
JST資料番号:
B0707B
ISSN:
0169-4332
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)