文献
J-GLOBAL ID:202202273244253599
整理番号:22A1043670
その場極端紫外リソグラフィースキャナ洗浄のための小型プラズマ源【JST・京大機械翻訳】
Miniature plasma source for in situ extreme ultraviolet lithographic scanner cleaning
著者 (6件):
de Kerkhof Mark van
(Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600MB Eindhoven, The Netherlands)
,
Osorio Edgar
(ASML Netherlands B.V., P.O. Box 324, 5500AH Veldhoven, The Netherlands)
,
Krivtsun Vladimir
(Institute of Spectroscopy of the Russian Academy of Sciences, Troitsk, Moscow 108840, Russia)
,
Spiridonov Maxim
(Space Research Institute, Russian Academy of Sciences, Moscow 117997, Russia)
,
Astakhov Dmitry
(Institute of Spectroscopy of the Russian Academy of Sciences, Troitsk, Moscow 108840, Russia)
,
Medvedev Viacheslav
(Institute of Spectroscopy of the Russian Academy of Sciences, Troitsk, Moscow 108840, Russia)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
40
号:
2
ページ:
022601-022601-7
発行年:
2022年
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)