文献
J-GLOBAL ID:202202290558367872
整理番号:22A1043679
極端紫外ダマシン拡張の詳細な実現可能性研究:パターン形成,誘電エッチおよびメタライゼーション【JST・京大機械翻訳】
In-depth feasibility study of extreme ultraviolet damascene extension: Patterning, dielectric etch, and metallization
著者 (10件):
Sun Xinghua
(TEL Technology Center, America, LLC, 255 Fuller Road, Suite 214, Albany, New York 12203)
,
Mignot Yann
(IBM Research Albany, 257 Fuller Road, Albany, New York 12203)
,
Cole Christopher
(TEL Technology Center, America, LLC, 255 Fuller Road, Suite 214, Albany, New York 12203)
,
Liu Eric
(TEL Technology Center, America, LLC, 255 Fuller Road, Suite 214, Albany, New York 12203)
,
Santos Daniel
(TEL Technology Center, America, LLC, 255 Fuller Road, Suite 214, Albany, New York 12203)
,
Raley Angelique
(TEL Technology Center, America, LLC, 255 Fuller Road, Suite 214, Albany, New York 12203)
,
Church Jennifer
(IBM Research Albany, 257 Fuller Road, Albany, New York 12203)
,
Meli Luciana
(IBM Research Albany, 257 Fuller Road, Albany, New York 12203)
,
Sieg Stuart A.
(IBM Research Albany, 257 Fuller Road, Albany, New York 12203)
,
Biolsi Peter
(TEL Technology Center, America, LLC, 255 Fuller Road, Suite 214, Albany, New York 12203)
資料名:
Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
(Journal of Vacuum Science & Technology. B. Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena)
巻:
40
号:
2
ページ:
023207-023207-9
発行年:
2022年
JST資料番号:
E0974A
ISSN:
2166-2746
CODEN:
JVTBD9
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)