林幸裕

ハヤシユキヒロ | Hayashi Yukihiro

所属機関・部署：
職名：研究員

研究分野 (1件)：電子デバイス、電子機器

研究キーワード (8件)：信頼性 , 環境試験 , はんだ , 電子機器 , Reliability , Emvironment test , Solder , Electronic equipment

競争的資金等の研究課題 (2件)：

MISC (10件)：

Y. Hayashi, A. Sakai, H. Ikeda, S. Zaima and Y. Yasuda, Surface and Interface Smoothing of Epitaxial CoSi₂ Films by Solid-Phase Epitaxy Using Adsorbed Oxygen Layers and Two-Step Growth on Si(001) Surfaces. Japanese Journal of Applied Physics. 2003. Vol. 42 pp. 7039-7044
Y. Hayashi, T. Katoh, H. Ikeda, A. Sakai, S. Zaima and Y. Yasuda Application of a two-step Growth to the formation of epitaxial CoSi₂ films on Si(001) surfaces:Comparative study using Reactive deposition epitaxy. Japanese Journal of Applied Physics. 2001. Vol. 40 269-275
Y. Hayashi, T. Katoh, H. Ikeda, A. Sakai, S. Zaima and Y. Yasuda Application of a two-step Growth to the formation of epitaxial CoSi₂ films on Si(001) surfaces:Comparative study using Reactive deposition epitaxy. Japanese Journal of Applied Physics. 2001. Vol. 40 269-275
Y. Hayashi, Y. Matsuoka, T. Katoh, H. Ikegami, H. Ikeda, S. Zaima and Y. Yasuda, A new growth method of epitaxial cobalt disilicide on Si(100),. Advanced Metalization and Interconnect Systems for ULSI Applications in 1997 (Materials Research Society, Warrendale, PA, 1998) pp.663-668
Y. Hayashi, Y. Matsuoka, H. Ikeda, S. Zaima and Y. Yasuda, Effects of initial surface states on formation processes of epitaxial CoSi₂(100) on Si(100). Thin Solid Films 343-344 (1999) 562-566

学位 (2件)：

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林 幸裕