Preparation of metal nitride films by reactive sputtering
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論文 (177件):
Yoshio Abe, Masaki Kataoka, Yuki Yokoiwa, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba. Reactive sputter deposition of β-Ni(OH)2 thin films in Ar + H2O mixed gas atmosphere at a substrate temperature of -80 °C. Japanese Journal of Applied Physics. 2023. 62. 4. 045502-045502
Koji Mizukoshi, Takafumi Yamamura, Yasuhiro Tomioka, Midori Kawamura. Effect of blocking layer on achieving low sheet resistances in low-E multilayer structures. Japanese Journal of Applied Physics. 2023. 62. 4. 045501-045501
Yoshio Abe, Yui Kadowaki, Midori Kawamura, Kyung Ho Kim, Takayuki Kiba. Two-color electrochromic devices using a tungsten oxide and nickel oxide double layer. Japanese Journal of Applied Physics. 2022. 62. 1. 015502-015502
P. Pokorný, M. Novotný, J. More-Chevalier, Y. Dekhtyar, M. Romanova, M. Davídková, S. Chertopalov, P. Fitl, M. Hruška, M. Kawamura, et al. Surface processes on thin layers of black aluminum in ultra-high vacuum. Vacuum. 2022. 205. 111377-111377
Koji Mizukoshi, Takafumi Yamamura, Yasuhiro Tomioka, Midori Kawamura. Effects of sputtering with Kr gas and insertion of lowermost layer on electrical resistivity of Ag-multilayer. Japanese Journal of Applied Physics. 2022. 61. 9. 095503-095503