Naoya Okada, Noriyuki Uchida, Shinichi Ogawa, Toshihiko Kanayama. Amorphous Si-rich tungsten silicide with a low work function near the conduction band edge of Si. Applied Physics Express. 2020. 13. 6
Hitoshi Yamamura, Yuji Ohishi, Yukari Katsura, Kaoru Kimura, Noriyuki Uchida, Toshihiko Kanayama. Stability and bonding nature for icosahedral or planar cluster of hydrogenated boron or aluminum. AIP Advances. 2019. 9. 11. 115117-115117
Naoya Okada, Noriyuki Uchida, Shinichi Ogawa, Toshihiko Kanayama. Cluster-Preforming-Deposited Si-rich W Silicide: A new contact material for advanced CMOS. ECS Transactions. 2019. 89. 3. 155-164
Naoya Okada, Noriyuki Uchida, Shinichi Ogawa, Toshihiko Kanayama. Gas-phase reactions of WF6 with SiH4 for deposition of WSin films free from powder formation. Japanese Journal of Applied Physics. 2019. 58
Toshihiko Kanayama, Noriyuki Kawashima, Noriyuki Uchida. Initial growth kinetics of positive and negative hydrogenated Si cluster ions under the presence of silane radicals. Japanese Journal of Applied Physics. 2019. 58. 4
Yuji Ohishi, Yuji Ohishi, Kaoru Kimura, Masaaki Yamaguchi, Noriyuki Uchida, Toshihiko Kanayama. Ionization of decaborane with controlled hydrogen content by charge transfer from ambient gas. Materials Research Society Symposium Proceedings. 2011. 1307. 94-99
Yuji Ohishi, Yuji Ohishi, Kaoru Kimura, Masaaki Yamaguchi, Noriyuki Uchida, Toshihiko Kanayama. Synthesis and formation mechanism of hydrogenated boron clusters B12 Hnwith controlled hydrogen content. Journal of Chemical Physics. 2010. 133
Yuji Ohishi, Kaoru Kimura, Masaaki Yamaguchi, Noriyuki Uchida, Toshihiko Kanayama. Energy barrier of structure transition from icosahedral B 12H6+ to planar B12H 5+ and B12H4+ clusters. Journal of Physics: Conference Series. 2009. 176. 012030-012030