Deposition and Characterization of Shape Memory Alloy Films
Preparation and Characterization of Reactive Sputtered Nitride Films
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論文 (194件):
Shozo Inoue, Naoto Morikawa, Akira Heya, Takahiro Namazu. Deposition of W-C films by dual source dc magnetron sputtering. Proceedings of 19th International Conference on Precision Engineering (ICPE2022, Nara). 2022. C132
S. Kammachi, Y. Goshima, N. Goami, N. Yamashita, S. Kakinuma, K. Nishikata, N. Naka, S. Inoue, T. Namazu. Cathodoluminescence Spectroscopic Stress Analysis for Silicon Oxide Film and Its Damage Evaluation. Materials. 2020. 13. 4490-8 pages
Shozo Inoue, Yu Fujiwara, Najami Zahira, Naoki Umada. Effect of deposition condition on the crystal phase of 18-8 stainless steel films prepared by dc magnetron sputtering. Proceedings of the 15th International Symposium on Sputtering and Plasma Processes (ISSP2019). 2019. 188-190