Hiromasa Shimizu, Kota Shinohara, Masahiko Hasumi. Improvement of photothermal heating efficiency of Si plasmonic waveguide heaters with ring resonators. Japanese Journal of Applied Physics. 2024. 63. 5. 052004-052004
Masahiko Hasumi, Toshiyuki Sameshima, Tomohisa Mizuno. Passivation of cut edges of crystalline silicon by heat treatment in liquid water. Japanese Journal of Applied Physics. 2023. 62. SK. SK1022-SK1022
Nana Ota, Kota Shinohara, Masahiko Hasumi, Hiromasa Shimizu. Quantification of 288 K local photothermal heating and miniaturization in Si plasmonic waveguides integrated with resonators. Japanese Journal of Applied Physics. 2023. 62. 4. 042002-042002
Masahiko Hasumi, Toshiyuki Sameshima, Ryota Seki, Takuma Uehara, Takuji Arima, Tomoyoshi Miyazaki, Go Kobayashi, Izumi Serizawa. Activation of Dopant Atoms in Silicon by Microwave-Induced Rapid Heating with Wireless Carbon Heating Tubes. Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials. 2020. 409-410
Toshiyuki Sameshima, Masahiko Hasumi, Tomohisa Mizuno. Non-Destructive 9.35GHz Microwave Sensing System for Investigating Electrical Properties of Silicon. Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials. 2020. 407-408
T. Sameshima, M.Shimokawa, J.Takenezawa, T.Nagao M.Hasumi, S.Yoshidomi, N.Sano, T.Mizuno. Analysis of Microwave Absorption by Photo-Induced Carriers at PN Junction Formed by Ion Implantation. Proceedings of 6th Thin Film Materials and Devices Meeting. 2010. 100228115. 1-6
Fabrication of Polycrystalline Silicon Thin Films at 300oC Using Dehydrogenation by Argon Ion Implantation
(The 24th International Meeting on Information Display 2024)
Excimer-Laser-Induced Crystallization of Amorphous Silicon Films deposited at 300oC Using Dehydrogenation by Argon Ion Implantation at 25 and 300oC
(THE 31st INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES 2024)