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DANG THAI GIANG

所属機関・部署：
職名：助教

研究分野 (4件)：電気電子材料工学 , 薄膜、表面界面物性 , ナノ材料科学 , 構造材料、機能材料

研究キーワード (6件)：半導体および半導体デバイス , 酸化半導体 , ハイパワーデバイス , mist CVD , ヘテロ構造 , ショットキーダイオード, 高移動度トランジスタ,FETs

競争的資金等の研究課題 (3件)：

2016 - 2018 High performance HEMT fabricated by mist CVD
2015 - 2015 Construction of a mist CVD system at UC
2014 - 2014 Building up a mist chemical vapour deposition system for optical device and solar cell applications

論文 (29件)：

G. T. Dang, T. Yasuoka, T. Kawaharamura. Sub-μm features patterned with laser interference lithography for the epitaxial lateral overgrowth of α-Ga2O3 via mist chemical vapor deposition. Applied Physics Letters. 2021. 119. 4
Li Liu, Toshiyuki Kawaharamura, Masahito Sakamoto, Misaki Nishi, Giang T. Dang, Shota Sato. The Quality Improvement of Yttrium Oxide Thin Films Grown at Low Temperature via the Third-Generation Mist Chemical Vapor Deposition Using Oxygen-Supporting Sources. PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS. 2021
Leila Ghadbeigi, Jacqueline Cooke, Giang T. Dang, Toshiyuki Kawaharamura, Tatsuya Yasuoka, Rujun Sun, Praneeth Ranga, Sriram Krishnamoorthy, Michael A. Scarpulla, Berardi Sensale-Rodriguez. Optical Characterization of Gallium Oxide α and β Polymorph Thin-Films Grown on c-Plane Sapphire. Journal of Electronic Materials. 2021. 50. 6. 2990-2998
Tatsuya Yasuoka, Li Liu, Tamako Ozaki, Kanta Asako, Yuna Ishikawa, Miyabi Fukue, Giang T. Dang, Toshiyuki Kawaharamura. The effect of HCl on the α-Ga2O3 thin films fabricated by third generation mist chemical vapor deposition. AIP Advances. 2021. 11. 4. 045123-045123
Conductive Si-doped α-(AlxGa1-x)2O3 Thin Films with the Band Gaps up to 6.22 eV. 2020. 10. 11. 115019

MISC (2件)：

講演・口頭発表等 (9件)：

Si:alpha-(AlxGa1-x)2O3/alpha-(CryGa1-y2O3高電子移動度トランジスタの開発
(International Workshop on Gallium Oxide and other Related Materials 2019)
Properties of corundum structure a-(CrxGa1-x)2O3 and a-(AlxGa1-x)2O3 thin films grown via Mist CVD
(The 8th International Conerence on Advanced Materials & Nanotechnology, Queenstown, New Zealand, 2017)
Transistors on Oxide Semiconductor Channels Grown via Mist-CVD
(The 22nd International Display Workshops, Otsu, Japan, 2015)
Fabrication of Functional Thin Films and Electrical Devices by Mist CVD Equipping Highly Accurate Flow Control Technology under Atmospheric Pressure
(Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices, Jeju, Korea, 2015)
Successful fabrication and high stability under bias temperature illumination stresses of MESFETs with an amorphous In-Ga-Zn-O channel grown by non-vacuum solution-processed Mist-CVD
(The 7th International Conference on Advanced Materials & Nanotechnology, Nelson, New Zealand, 2015)

学歴 (2件)：

経歴 (3件)：

受賞 (3件)：

2014 - The 75th Japan Society of Applied Physics Annual Autumn Meeting Poster Award
2011 - The 11th International Workshop on Plasma-based Ion Implantation and Deposition Student Paper Award
2010 - Kochi University of Technology Terada Prize, Vice-president award for excellent research

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