井谷俊郎

イタニトシロウ | Itani Toshiro

所属機関・部署：
職名：首席研究員
その他の所属（所属・部署名・職名） (1件)：

研究分野 (1件)：電気電子材料工学

論文 (155件)：

Julius Joseph Santillan, Akihiro Konda, Motoharu Shichiri, Toshiro Itani. Single-component silicon-based patterning materials for EUV lithography. Proc. SPIE. 2023. Advances in Patterning Materials and Processes XL. 12498. 1249814
Masahiko Harumoto, Andreia Figueiredo dos Santos, JULIUS JOSEPH SANTILLAN, Toshiro Itani, Takahiro KOZAWA. Photoresist stochastic defect generation depending on alkyl chain length and concentration of tetraalkylammonium hydroxide in alkali aqueous developer. Japanese Journal of Applied Physics. 2023. 62. SG1037
Masahiko Harumoto, Andreia Figueiredo dos Santos, Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa. Stochastic defect generation depending on tetraalkylhydroxide aqueous developers in extreme ultraviolet lithography. Japanese Journal of Applied Physics. 2023. 62. 1. 016503-016503
Julius Joseph Santillan, Kyoko Shimizu, Ryuichi Otogawa, Toshiro Itani. Effect of Alternative Developer Solutions on EUVL Patterning. Journal of Photopolymer Science and Technology. 2022. 35. 1. 67-74
Masahiko Harumoto, Julius Joseph Santillan, Toshiro Itani, Takahiro Kozawa. Dependence of photoresist dissolution dynamics in alkaline developers on alkyl chain length of tetraalkylammonium hydroxide. Japanese Journal of Applied Physics. 2022. 61. 5. 056506-056506

MISC (28件)：

講演・口頭発表等 (4件)：

Extremely large depth-of-focus lithography system using KrF excimer laser
(32nd International Microprocesses and Nanotechnology Conference 2019)
Alternative developer solutions and processes for EUV lithography
(SPIE Photomask Technology + Extreme Ultraviolet Lithography 2019)
Alternative developer solutions and processes for EUV and ArFi lithography
(The 36th International Conference of Photopolymer Science and Technology 2019)
Resist patterning characteristics using KrF laser ablation process
(The 36th International Conference of Photopolymer Science and Technology 2019)

学歴 (1件)：

学位 (1件)：

委員歴 (4件)：

2017/09 - 現在 SPIE Photomask Technology + Extreme Ultraviolet Lithography Conference chair
2008/04 - 現在応用物理学会次世代リソグラフィ(NGL)技術研究会分科会幹事
2007/04 - 現在 Microprocess and Nanotechnology Conference (MNC)、組織委員会組織委員
2009/04 - 2022/03 応用物理学会論文誌企画・編集委員会 APEX/JJAP編集運営委員

受賞 (1件)：

2009/09 - SPIE Photomask Technology + EUV Lithography 2nd place Photomask Best Poster Award

所属学会 (2件)：

The International Society for Optical Engineering (SPIE) , 応用物理学会

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井谷 俊郎