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J-GLOBAL ID：201902200271586793   整理番号：19S0223701

Large area SiH4/H2 VHF plasma produced with multi-rod electrode

著者 (8件)： Nishimiya, Tatsuyuki (Nagasaki Research and Development Center, Mitsubishi Heavy Industries Ltd.) ,  Takeuchi, Yoshiaki (Nagasaki Research and Development Center, Mitsubishi Heavy Industries Ltd.) ,  Yamauchi, Yasuhiro (Nagasaki Shipyard and Machinery Works, Mitsubishi Heavy Industries Ltd.) ,  Takatsuka, Hiromu (Nagasaki Shipyard and Machinery Works, Mitsubishi Heavy Industries Ltd.) ,  Kai, Yuichi (Interdisciplinary Graduate School of Engineering Sciences, Kyushu University) ,  Muta, Hiroshi (Interdisciplinary Graduate School of Engineering Sciences, Kyushu University) ,  Kawai, Yoshinobu (Interdisciplinary Graduate School of Engineering Sciences, Kyushu University) ,  Kawai, Yoshinobu (Research Institute for Applied Mechanics, Kyushu University)
資料名： Plasma Processes and Polymers
巻： 4  号： SUPPL.1  ページ： S991-S994  発行年： 2007年 
JST資料番号： SCOPUS  ISSN： 1612-8850 
発行国： ドイツ (DEU)  言語： 英語 (EN)

タイトルに関連する用語 (3件)： SiH4 ,  H2 ,  VHF