文献

J-GLOBAL ID：201902204532884849   整理番号：19S1442165

A study of the critical factor determining the size of etched latent tracks formed on SiO 2 glass by swift-Cl-ion irradiation

著者 (8件)： Nomura, Ken-Ichi (Department of Electrical Engineering and Bioscience, Waseda University) ,  Nomura, Ken-Ichi (Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)) ,  Ohki, Yoshimichi (Department of Electrical Engineering and Bioscience, Waseda University) ,  Wang, Xiaomin (Department of Electrical Engineering and Bioscience, Waseda University) ,  Wang, Xiaomin (Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)) ,  Fujimaki, Makoto (Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)) ,  Awazu, Koichi (Photonics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST)) ,  Komatsubara, Tetsuro (Tandem Accelerator Complex, Research Facility Center for Science and Technology, University of Tsukuba)
資料名： Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
巻： 272  ページ： 1-4  発行年： 2012年 
JST資料番号： SCOPUS  ISSN： 0168-583X  CODEN： NIMBE 
発行国： オランダ (NLD)  言語： 英語 (EN)

タイトルに関連する用語 (1件)： SiO