山川進二

ヤマカワシンジ | Yamakawa Shinji

所属機関・部署：
職名：准教授
ホームページURL (1件)： https://www.lasti.u-hyogo.ac.jp/sr-nanotechnology/index.html

研究分野 (2件)：光工学、光量子科学 , 高分子化学

研究キーワード (6件)：軟X線分析 , フォトレジスト , EUVリソグラフィ , 放射光 , 高分子合成 , 錯体触媒

競争的資金等の研究課題 (1件)：

論文 (17件)：

Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe. The x-ray absorption spectroscopy analysis of the negative-tone PAG bound resist. International Conference on Extreme Ultraviolet Lithography 2023. 2023
Umi Fujimoto, Tetsuo Harada, Shinji Yamakawa, Takeo Watanabe. Carbon/boron multilayer for beyond EUV lithography. Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology. 2023
Rikuya Imai, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe. Present Status of EUV Interference Lithography at NewSUBARU. Journal of Photopolymer Science and Technology. 2023. 36. 1. 53-59
Shinji Yamakawa, Tetsuo Harada, Koji Nakanishi, Takeo Watanabe. Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU. Journal of Photopolymer Science and Technology. 2023. 36. 1. 47-52
Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe. Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering. Journal of Photopolymer Science and Technology. 2023. 36. 1. 41-45

MISC (7件)：

Shuhei Iguchi, Tetsuo Harada, Shinji Yamakawa, Takeo Watanabe. Spatial Distribution Evaluation of EUV Resist Using Reflection-type Projection Soft X-Ray Microscope. IPC2023. 2023
Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe. Evaluation of the Chemical Component Distribution in Resist Thin Film by Grazing Incidence Resonant Soft X-ray Scattering. IPC2023. 2023
Tsukasa Sasakura, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe. Investigation of the Chemical Imaging of Resist Thin Films by Photoemission Electron Microscopy at NewSUBARU. IPC2023. 2023
Shinji Yamakawa, Atsunori Nakamoto, Shuhei Iguchi, Tsukasa Sasakura, Tetsuo Harada, Takeo Watanabe. Analysis of the Chemical Component Distribution in EUV Resist Thin Films by Soft X-Ray. IPC2023. 2023
山川進二. NewSUBARU放射光施設におけるEUVレジスト薄膜の軟X線分析. 兵庫県立大学第47回異分野融合若手研究者Science&Technologyクラブ. 2023

特許 (2件)：

講演・口頭発表等 (68件)：

Photoemission electron microscopy (PEEM) study of chemical composition on the surface of EUV resist thin films
(International Conference on Extreme Ultraviolet Lithography 2024 2024)
Development of reflection type soft x-ray projection microscope for the spatial distribution imaging of resist thin film
(International Conference on Extreme Ultraviolet Lithography 2024 2024)
High performance C/B multilayer for beyond EUV lithography
(International Conference on Extreme Ultraviolet Lithography 2024 2024)
Diffraction efficiency measurements of two-window-transmission grating for EUV and beyond EUV interference lithography
(International Conference on Extreme Ultraviolet Lithography 2024 2024)
Outgas evaluation of cable materials for EUV lithography system
(International Conference on Extreme Ultraviolet Lithography 2024 2024)

学歴 (3件)：

学位 (1件)：

経歴 (3件)：

委員歴 (1件)：

受賞 (1件)：

所属学会 (5件)：

応用物理学会 , 日本放射光学会 , SPIE , フォトポリマー学会 , 高分子学会

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山川 進二