Takashi Hamano, Takayuki Matsuda, Yuya Asamoto, Masao Noma, Shigehiko Hasegawa, Michiru Yamashita, Keiichiro Urabe, Koji Eriguchi. Spectroscopic ellipsometry characterization of boron nitride films synthesized by a reactive plasma-assisted coating method. Applied Physics Letters. 2022. 120. 3. 031904-031904
Koji Eriguchi, Takashi Hamano, Keiichiro Urabe. Improvement of the plasma-induced defect generation model in Si substrates and the optimization design framework. Plasma Processes and Polymers. 2019. 16. 9. 1900058-1900058
Takashi Hamano, Keiichiro Urabe, Koji Eriguchi. Investigation of spatial and energy profiles of plasma process-induced latent defects in Si substrate using capacitance-voltage characteristics. Journal of Physics D: Applied Physics. 2019
Takashi Hamano, Koji Eriguchi. Incident ion dose evolution of damaged layer thickness in Si substrate exposed to Ar and He plasmas. Japanese Journal of Applied Physics. 2018. 57. 6S2. 06JD02-06JD02
MISC (3件):
T. Matsuda, T. Hamano, Y. Asamoto, M. Noma, M. Yamashita, S. Hasegawa, K. Urabe, K. Eriguchi. Ion irradiation-induced sputtering and surface modification of BN films prepared by a reactive plasma-assisted coating technique. Japanese Journal of Applied Physics. 2022. 61. SI
Effects of Variability in Plasma-Induced Damage to Si Substrate on Device Performance and Its Application to Variability Assessment Methodology
(第20回 関西コロキアム電子デバイスワークショップ 2020)