文献
J-GLOBAL ID:200902213621623163
整理番号:08A0818586
多結晶BiFeO3薄膜の電場下でのX線回折研究
X-ray diffraction study of polycrystalline BiFeO3 thin films under electric field
著者 (6件):
NAKASHIMA Seiji
(Dep. of Systems Innovation, Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka ...)
,
SAKATA Osami
(Japan Synchrotron Radiation Res. Institute/SPring-8, Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198, JPN)
,
NAKAMURA Yoshitaka
(Dep. of Systems Innovation, Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka ...)
,
KANASHIMA Takeshi
(Dep. of Systems Innovation, Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka ...)
,
FUNAKUBO Hiroshi
(Dep. of Innovative and Engineered Materials, Interdisciplinary Graduate School of Sci. and Technol., Tokyo Inst. of ...)
,
OKUYAMA Masanori
(Dep. of Systems Innovation, Graduate School of Engineering Sci., Osaka Univ., 1-3 Machikaneyama-Cho, Toyonaka, Osaka ...)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
93
号:
4
ページ:
042907
発行年:
2008年07月28日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)