文献
J-GLOBAL ID:200902230519036620
整理番号:08A0361068
低圧バイアス増強の核形成および成長による平滑な超ナノ結晶性ダイヤモンド薄膜の合成および特性評価
Synthesis and characterization of smooth ultrananocrystalline diamond films via low pressure bias-enhanced nucleation and growth
著者 (11件):
CHEN Y. C.
(Dep. of Materials Sci. and Engineering, National Tsing-Hua Univ., Hsin-Chu 300, Taiwan)
,
ZHONG X. Y.
(Center for Electron Microscopy, Argonne National Lab., Argonne, Illinois 60439, USA)
,
KONICEK A. R.
(Dep. of Physics, Univ. of Wisconsin-Madison, Madison, Wisconsin 53706, USA)
,
GRIERSON D. S.
(Dep. of Engineering Physics, Univ. of Wisconsin-Madison, Madison, Wisconsin 53706, USA)
,
TAI N. H.
(Dep. of Materials Sci. and Engineering, National Tsing-Hua Univ., Hsin-Chu 300, Taiwan)
,
LIN I. N.
(Dep. of Physics, Tamkang Univ., Tamsui 251, Taiwan)
,
KABIUS B.
(Center for Electron Microscopy, Argonne National Lab., Argonne, Illinois 60439, USA)
,
HILLER J. M.
(Center for Electron Microscopy, Argonne National Lab., Argonne, Illinois 60439, USA)
,
SUMANT A. V.
(Center for Nanoscale Materials, Argonne National Lab., Argonne, Illinois 60439, USA)
,
CARPICK R. W.
(Dep. of Mechanical Engineering and Applied Mechanics, Univ. of Pennsylvania, Philadelphia, Pennsylvania 19104, USA)
,
AUCIELLO O.
(Materials Sci. Div., Argonne National Lab., Argonne, Illinois 60439, USA)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
92
号:
13
ページ:
133113
発行年:
2008年03月31日
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
短報
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)