文献
J-GLOBAL ID:200902266644233377
整理番号:08A0996346
オゾンと1,1,1,3,3,3-ヘキサメチルジシラザンとの光化学反応 光化学蒸着過程での前駆体間の気相反応の解析
Photochemical Reaction of Ozone and 1,1,1,3,3,3-Hexamethyldisilazane: Analysis of the Gas Reaction between Precursors in a Photochemical Vapor Deposition Process
著者 (7件):
NAKAMURA Ken
(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
NONAKA Hidehiko
(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
KAMEDA Naoto
(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
KAMEDA Naoto
(Meidensha Corp., Shizuoka, JPN)
,
NISHIGUCHI Tetsuya
(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
,
NISHIGUCHI Tetsuya
(Meidensha Corp., Shizuoka, JPN)
,
ICHIMURA Shingo
(National Inst. of Advanced Industrial Sci. and Technol. (AIST), Ibaraki, JPN)
資料名:
Japanese Journal of Applied Physics
(Japanese Journal of Applied Physics)
巻:
47
号:
9 Issue 1
ページ:
7349-7355
発行年:
2008年09月25日
JST資料番号:
G0520B
ISSN:
0021-4922
CODEN:
JJAPB6
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
イギリス (GBR)
言語:
英語 (EN)