文献
J-GLOBAL ID:200902293476009048
整理番号:05A0995590
ほう素をドープした(111)表面上でのミクロンサイズのゲート長さを有するダイヤモンドMISFETの作製
Fabrication of diamond MISFET with micron-sized gate length on boron-doped (111) surface
著者 (7件):
SAITO Takeyasu
(Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol., Tsukuba, Ibaraki 305-8568, JPN)
,
PARK Kyung-ho
(Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol., Tsukuba, Ibaraki 305-8568, JPN)
,
HIRAMA Kazuyuki
(Dep. of Electrical Engineering and Bioscience, Waseda Univ., Shinjyuku-ku, Tokyo 169-8555, JPN)
,
UMEZAWA Hitoshi
(Dep. of Electrical Engineering and Bioscience, Waseda Univ., Shinjyuku-ku, Tokyo 169-8555, JPN)
,
SATOH Mitsuya
(Dep. of Electrical Engineering and Bioscience, Waseda Univ., Shinjyuku-ku, Tokyo 169-8555, JPN)
,
KAWARADA Hiroshi
(Dep. of Electrical Engineering and Bioscience, Waseda Univ., Shinjyuku-ku, Tokyo 169-8555, JPN)
,
OKUSHI Hideyo
(Diamond Res. Center, National Inst. of Advanced Industrial Sci. and Technol., Tsukuba, Ibaraki 305-8568, JPN)
資料名:
Diamond and Related Materials
(Diamond and Related Materials)
巻:
14
号:
11-12
ページ:
2043-2046
発行年:
2005年11月
JST資料番号:
W0498A
ISSN:
0925-9635
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)