文献
J-GLOBAL ID:201102243694473334
整理番号:11A1514331
ZnO低温ホモエピタキシーの成長機構
Growth mechanism of ZnO low-temperature homoepitaxy
著者 (7件):
PARK S. H.
(Center for Interdisciplinary Res., Tohoku Univ., Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, JPN)
,
MINEGISHI T.
(Center for Interdisciplinary Res., Tohoku Univ., Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, JPN)
,
LEE H. J.
(Center for Interdisciplinary Res., Tohoku Univ., Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, JPN)
,
OH D. C.
(Center for Optoelectronic Materials and Devices, Dep. of Defense Sci. and Technol., Hoseo Univ., 165 Sechul-ri ...)
,
KO H. J.
(Photonics Device Team, Korea Photonics Technol. Inst., 971-35 Wolchul-dong, Buk-gu, Gwangju, 500-779, KOR)
,
CHANG J. H.
(Center for Interdisciplinary Res., Tohoku Univ., Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, JPN)
,
YAO T.
(Center for Interdisciplinary Res., Tohoku Univ., Aoba 6-3, Aramaki, Aobak-ku, Sendai 980-8578, JPN)
資料名:
Journal of Applied Physics
(Journal of Applied Physics)
巻:
110
号:
5
ページ:
053520
発行年:
2011年09月01日
JST資料番号:
C0266A
ISSN:
0021-8979
CODEN:
JAPIAU
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)