文献
J-GLOBAL ID:201302202968500690
整理番号:13A0953839
応力/転位加工中間層を使って改善されたSi(111)基板上に成長したGaNを用いたLED
Improved GaN-based LED grown on silicon (111) substrates using stress/dislocation-engineered interlayers
著者 (5件):
MA Jun
(Photonics Technol. Center, Dep. of Electronic and Computer Engineering, Hong Kong Univ. of Sci. and Technol., Clear ...)
,
ZHU Xueliang
(Photonics Technol. Center, Dep. of Electronic and Computer Engineering, Hong Kong Univ. of Sci. and Technol., Clear ...)
,
WONG Ka Ming
(Photonics Technol. Center, Dep. of Electronic and Computer Engineering, Hong Kong Univ. of Sci. and Technol., Clear ...)
,
ZOU Xinbo
(Photonics Technol. Center, Dep. of Electronic and Computer Engineering, Hong Kong Univ. of Sci. and Technol., Clear ...)
,
LAU Kei May
(Photonics Technol. Center, Dep. of Electronic and Computer Engineering, Hong Kong Univ. of Sci. and Technol., Clear ...)
資料名:
Journal of Crystal Growth
(Journal of Crystal Growth)
巻:
370
ページ:
265-268
発行年:
2013年05月01日
JST資料番号:
B0942A
ISSN:
0022-0248
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)