文献
J-GLOBAL ID:201602252308248696
整理番号:16A1274035
Effects of annealing temperature on characteristics of amorphous nickel carbon thin film alloys deposited on n-type silicon substrates by reactive sputtering
著者 (2件):
Hong Zih-Chen
(Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung, 40227, Taiwan)
,
Shiue Sham-Tsong
(Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung, 40227, Taiwan)
資料名:
Thin Solid Films
(Thin Solid Films)
巻:
618
号:
PA
ページ:
21-27
発行年:
2016年
JST資料番号:
B0899A
ISSN:
0040-6090
資料種別:
逐次刊行物 (A)
発行国:
オランダ (NLD)
言語:
英語 (EN)