文献
J-GLOBAL ID:201702257238612310
整理番号:17A0658471
塩化アンモニウムを用いた塩素化プロセスによるGaN半導体からのガリウムの高温冶金回収
Pyrometallurgical Recovery of Gallium from GaN Semiconductor through Chlorination Process Utilizing Ammonium Chloride
著者 (4件):
Nishinaka Kazuki
(Department of Molecular Design and Engineering, Graduate School of Engineering, Nagoya University)
,
Terakado Osamu
(Department of Material and Environmental Engineering, National Institute of Technology, Hakodate College)
,
Tani Haruki
(Department of Molecular Design and Engineering, Graduate School of Engineering, Nagoya University)
,
Hirasawa Masahiro
(Department of Molecular Design and Engineering, Graduate School of Engineering, Nagoya University)
資料名:
Materials Transactions
(Materials Transactions)
巻:
58
号:
4
ページ:
688-691(J-STAGE)
発行年:
2017年
JST資料番号:
G0668A
ISSN:
1345-9678
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
日本 (JPN)
言語:
英語 (EN)