文献
J-GLOBAL ID:201702279302029449
整理番号:17A1830817
AlGaN薄膜表面上のN_2とO_2プラズマ誘起損傷の特性【Powered by NICT】
Characteristics of N2 and O2 Plasma-Induced Damages on AlGaN Thin Film Surfaces
著者 (6件):
Kawakami Retsuo
(Graduate School of Technology, Industrial and Social Sciences, Tokushima University, Tokushima 770-8506, Japan)
,
Niibe Masahito
(Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan)
,
Nakano Yoshitaka
(Chubu University, Kasugai, Aichi 487-8501, Japan)
,
Tanaka Ryo
(Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan)
,
Azuma Chisato
(Graduate School of Technology, Industrial and Social Sciences, Tokushima University, Tokushima 770-8506, Japan)
,
Mukai Takashi
(Nichia Corporation, Anan, Tokushima 774-0044, Japan)
資料名:
Physica Status Solidi. A. Applications and Materials Science
(Physica Status Solidi. A. Applications and Materials Science)
巻:
214
号:
11
ページ:
ROMBUNNO.201700393
発行年:
2017年
JST資料番号:
D0774A
ISSN:
1862-6300
CODEN:
PSSABA
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
ドイツ (DEU)
言語:
英語 (EN)