文献
J-GLOBAL ID:201802214444550755
整理番号:18A2071987
RFマグネトロンスパッタリングによるジルコニア基板上のSi-O被覆の濡れ性と耐久性【JST・京大機械翻訳】
Wettability and Durability of Si-O Coatings on Zirconia Substrate by RF-Magnetron Plasma Sputtering
著者 (7件):
Yokogawa Yoshiyuki
(Osaka City University, Graduate School of Engineering; 3-3-138 Sugimoto, Sumiyoshi, Osaka, Japan, 558-8585)
,
Morishima Taishi
(Osaka City University, Graduate School of Engineering; 3-3-138 Sugimoto, Sumiyoshi, Osaka, Japan, 558-8585)
,
Uno Mitunori
(Asahi University, Graduate School of Dentistry; 1851 Hozumi, Hozumi, Japan, 501-0298)
,
Kurachi Masakazu
(Asahi University, Graduate School of Dentistry; 1851 Hozumi, Hozumi, Japan, 501-0298)
,
Doi Yutaka
(Asahi University, Graduate School of Dentistry; 1851 Hozumi, Japan, 501-0298 Gifu)
,
Kawaki Harumi
(Asahi University, Graduate School of Dentistry; 1851 Hozumi, Japan, 501-0298 Gifu)
,
Hotta Masato
(Asahi University, Graduate School of Dentistry; 1851 Hozumi, Hozumi, Japan, 501-0298)
資料名:
Key Engineering Materials
(Key Engineering Materials)
巻:
782
ページ:
189-194
発行年:
2018年
JST資料番号:
D0744C
ISSN:
1013-9826
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
スイス (CHE)
言語:
英語 (EN)