文献
J-GLOBAL ID:201802227913525372
整理番号:18A0488122
K_2NiF_4構造を持つ高_C銅酸化物の薄膜におけるエピタキシャル効果【Powered by NICT】
Epitaxial effects in thin films of high-T c cuprates with the K2NiF4 structure
著者 (4件):
Naito Michio
(Department of Applied Physics, Tokyo University of Agriculture and Technology, Naka-cho 2-24-16, Koganei, Tokyo 184-8588, Japan)
,
Sato Hisashi
(NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan)
,
Tsukada Akio
(NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan)
,
Yamamoto Hideki
(NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan)
資料名:
Physica C. Superconductivity and Its Applications
(Physica C. Superconductivity and Its Applications)
巻:
546
ページ:
84-114
発行年:
2018年
JST資料番号:
T0580A
ISSN:
0921-4534
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
オランダ (NLD)
言語:
英語 (EN)