文献
J-GLOBAL ID:201802250453803416
整理番号:18A1066317
加圧水素ガス下のその場シンクロトロンX線全散乱セットアップの開発【JST・京大機械翻訳】
Development of an in situ synchrotron X-ray total scattering setup under pressurized hydrogen gas
著者 (6件):
Sakaki Kouji
(National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki305-8565, Japan)
,
Kim Hyunjeong
(National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki305-8565, Japan)
,
Machida Akihiko
(National Institutes for Quantum and Radiological Science and Technology, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo679-5148, Japan)
,
Watanuki Tetsu
(National Institutes for Quantum and Radiological Science and Technology, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo679-5148, Japan)
,
Katayama Yoshinori
(National Institutes for Quantum and Radiological Science and Technology, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo679-5148, Japan)
,
Nakamura Yumiko
(National Institute of Advanced Industrial Science and Technology, 1-1-1 Higashi, Tsukuba, Ibaraki305-8565, Japan)
資料名:
Journal of Applied Crystallography
(Journal of Applied Crystallography)
巻:
51
号:
3
ページ:
796-801
発行年:
2018年
JST資料番号:
D0631A
ISSN:
0021-8898
CODEN:
JACGAR
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)