文献
J-GLOBAL ID:201802270835523564
整理番号:18A1941184
シリコン中の衝突イオン化により発生した単一正孔の検出【JST・京大機械翻訳】
Detection of single holes generated by impact ionization in silicon
著者 (7件):
Firdaus Himma
(Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8011, Japan)
,
Watanabe Tokinobu
(Research Institute of Electronics, Shizuoka University, Hamamatsu 432-8011, Japan)
,
Hori Masahiro
(Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8011, Japan)
,
Moraru Daniel
(Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8011, Japan)
,
Takahashi Yasuo
(Graduate School of Information Science and Technology, Hokkaido University, Sapporo 060-0814, Japan)
,
Fujiwara Akira
(NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi 243-0198, Japan)
,
Ono Yukinori
(Graduate School of Science and Technology, Shizuoka University, Hamamatsu 432-8011, Japan)
資料名:
Applied Physics Letters
(Applied Physics Letters)
巻:
113
号:
16
ページ:
163103-163103-5
発行年:
2018年
JST資料番号:
H0613A
ISSN:
0003-6951
CODEN:
APPLAB
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)