文献
J-GLOBAL ID:201802283576644983
整理番号:18A1903933
高データレートおよび低遅延時間I/Oインタフェイスボードのための表皮効果抑制Ni-Fe/Cu電気めっき多層配線【JST・京大機械翻訳】
Skin Effect Suppressed Ni-Fe/Cu Electroplated Multilayer Wiring for High Data-Rate and Low Delay-Time I/O Interface Board
著者 (8件):
Yamaguchi Masahiro
(Department of Electrical Engineering, Tohoku University, Sendai, Japan)
,
Yanai Takeshi
(Division of Electrical Engineering and Computer Science, Nagasaki University, Nagasaki, Japan)
,
Nakayama Hidetoshi
(Department of Electronics and Control Engineering, Nagano College, National Institute of Technology, Nagano, Japan)
,
Sai Ranajit
(Department of Electrical Engineering, Tohoku University, Sendai, Japan)
,
Fujiwara Hiroaki
(Electronic Materials Business Division, Automotive & Industrial Systems Company, Panasonic Corporation, Kadoma, Japan)
,
Kitai Yuki
(Electronic Materials Business Division, Automotive & Industrial Systems Company, Panasonic Corporation, Kadoma, Japan)
,
Sato Mikio
(Electronic Materials Business Division, Automotive & Industrial Systems Company, Panasonic Corporation, Kadoma, Japan)
,
Sangawa Ushio
(Electronic Materials Business Division, Automotive & Industrial Systems Company, Panasonic Corporation, Kadoma, Japan)
資料名:
IEEE Transactions on Magnetics
(IEEE Transactions on Magnetics)
巻:
54
号:
11
ページ:
ROMBUNNO.4002705.1-5
発行年:
2018年
JST資料番号:
A0339B
ISSN:
0018-9464
CODEN:
IEMGAQ
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)