文献
J-GLOBAL ID:201902219757939390
整理番号:19A1416649
水素終端Si(111)-(1×1)表面上のAg島の成長モードに及ぼす堆積速度の影響:表面エネルギーと量子サイズ効果の役割【JST・京大機械翻訳】
Effects of the deposition rate on growth modes of Ag islands on the hydrogen-terminated Si(111)-(1 × 1) surface: The role of surface energy and quantum size effect
著者 (10件):
Kang Jungmin
(Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan)
,
Eguchi Toyoaki
(Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan)
,
Kawamoto Erina
(Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan)
,
Matsushita Stephane Yu
(Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan)
,
Haga Kenya
(Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan)
,
Kanagawa Shino
(Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan)
,
Wawro Andrzej
(Institute of Physics, Polish Academy of Sciences, Aleja Lotnikow 32/46, PL-02668 Warsaw, Poland)
,
Czajka Ryszard
(Institute of Physics, Faculty of Technical Physics, Poznan University of Technology, ul. Piotrowo 3, 60-965 Poznan, Poland)
,
Kato Hiroki
(Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan)
,
Suto Shozo
(Department of Physics, Graduate School of Science, Tohoku University, Sendai 980-8578, Japan)
資料名:
Journal of Applied Physics
(Journal of Applied Physics)
巻:
122
号:
9
ページ:
095303-095303-7
発行年:
2017年
JST資料番号:
C0266A
ISSN:
0021-8979
CODEN:
JAPIAU
資料種別:
逐次刊行物 (A)
記事区分:
原著論文
発行国:
アメリカ合衆国 (USA)
言語:
英語 (EN)